Vacuum Technology & Application Consultancy


3000W (15KV) Automatic Matching Network

For RF plasma control

3000w (15KV) Automatic Matching Network for RF plasma control changes the RF Generated impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. The Vac Techniche  automatic matching networks perform their operation in three independent modes.


The automatic mode continuously compensates the impedance variation of the plasma enclosure.
The manual mode allows the operator to change the matching capacitance values during the process.
In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.


The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.


Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.
Vac Techniche sapphire viewports are offered in CF, ISO and KF flange styles. The viewports comprise a high quality optic with precise flatness, parallelism, scratch and dig specifications. The single crystal sapphire windows have excellent optical, physical and chemical properties.


The hardest of the oxide crystals, sapphire retains its high strength at high temperatures. Sapphire has a low coefficient of thermal expansion and low fluorescence, good resistance to thermal shock and scratching making this an excellent material for IR transmitting optics and robust applications.
2000W Automatic Matching Network
5000W Automatic Matching Network