RF Plasma Generators 300W
RF Generators
For 2″ Magnetron Sputtering and Plasma generation
RF Generators for Sputtering and Plasma generators manufactured by Vac Techniche Ltd are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment.
The Vac Techniche RF generator along with its impedance matching network constitute a complete RF plasma generation assembly. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer .
Why 13.56 MHz?
This frequency is one of the most commonly used in the industrial, scientific, and medical (ISM) radio bands. This band allows for high-power activities without causing any disturbance in the surrounding telecommunications systems since it is for general use. Generators with powers ranging from a few milliwatts to several hundred kilowatts are used in this band.

More Details
RF Plasma Generators 300W
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Features and Capabilities
Technical Specifications
RF Generation Models
Reflected power limiter
Air-cooling (DC to RF conversion efficiency larger than 70%)
Graphical control, display and adjustment system with a touch screen
Various protection types (against reflected power, overtemperature, overcurrent, and overvoltage), capable of automatically limiting the transmitted power
0-5 V input voltage for remotely controlling the generator output power; more than 90% efficiency for larger than 300 W models
Analog output for transmitted and reflected power values
Closed-loop control of output power which stabilizes the adjusted power with time
Adequate shielding to prevent radiation and EMI noise with necessary measures to protect operator health
Rack-installable box
Technical Specifications
Power supply | 220 V (200-240 V), 50 Hz (50-60 Hz) |
Output frequency | 13.56 MHz |
Protection | Various types (protection against reflected power, overtemperature, overcurrent, and overvoltage), especially reflected power limiter |
Display | Graphic display with touch screen or digital display |
Remote control | Digital RS485 |
Working temperature | 10-40°C |
Cooling | Air conditioned |
Output impedance | 50Ω(resistive) |
Dimensions (cm) | Depends on device output |
Weight | Depends on device output |
Output connector | N – 7/16 |
Box material | aluminium |
RF generation Models
RFG150
RFG300
RFG600
RFG1000
RFG2000
RFG5000
Frequency (MHz)
13.56
13.56
13.56
13.56
13.56
13.56
Power (W)
150
300
600
1000
2000
5000
Output Impedance (ohms)
50
50
50
50
50
50
Connection type
Analog & Digital max485
Analog & Digital max485
Analog & Digital max485
Analog & Digital max485
Analog & Digital max485
Analog & Digital max485
Front Panel display
LCD
LCD
LCD
LCD
7segment
7segment
Output Connector
N
N
N
N
N
7/16
Touch Screen
Yes
Yes
Yes
Yes
No
No
Input Power
Single-phase
Single-phase
Single-phase
Single-phase
3phase
3phase
Cooling
air-cooled
air-cooled
air-cooled
air-cooled
air-cooled
air&water-cooled
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Specialising in materials deposition, Vac Techniche has developed working relationships with key Universities and researchers facilities world wide.
RF Plasma Generators 300W Catalogue
VacTechniche RF Generators
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Frequently Asked Questions
RF Plasma Generators 300W
An RF Plasma Generator uses radio frequency (RF) power to ionize gases, creating plasma. This plasma is utilized in various industrial applications, such as surface modification, cleaning, and coating. The RF plasma system achieves this by applying an RF voltage to a gas, generating a field that ionizes the gas molecules and produces plasma.
Our RF Plasma Generators in the 100-300W range are ideal for applications such as:
Surface activation
Etching and coating in microelectronics
Medical device manufacturing
Thin film deposition and precision cleaning