Vacuum Technology & Application Consultancy

RF Plasma Generators 300W

RF Generators

For 2″ Magnetron Sputtering and Plasma generation

RF Generators for Sputtering and Plasma generators manufactured by Vac Techniche Ltd are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment.

The Vac Techniche RF generator along with its impedance matching network constitute a complete RF plasma generation assembly. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz or other frequency bands according to the customer .

This frequency is one of the most commonly used in the industrial, scientific, and medical (ISM) radio bands. This band allows for high-power activities without causing any disturbance in the surrounding telecommunications systems since it is for general use. Generators with powers ranging from a few milliwatts to several hundred kilowatts are used in this band.
300W RF Generators and Plasma generation

More Details

RF Plasma Generators 300W

  • Reflected power limiter
  • Air-cooling (DC to RF conversion efficiency larger than 70%)
  • Graphical control, display and adjustment system with a touch screen
  • Various protection types (against reflected power, overtemperature, overcurrent, and overvoltage), capable of automatically limiting the transmitted power
  • 0-5 V input voltage for remotely controlling the generator output power; more than 90% efficiency for larger than 300 W models
  • Analog output for transmitted and reflected power values
  • Closed-loop control of output power which stabilizes the adjusted power with time
  • Adequate shielding to prevent radiation and EMI noise with necessary measures to protect operator health
  • Rack-installable box
Technical Specifications
Power supply
220 V (200-240 V), 50 Hz (50-60 Hz)
Output frequency
13.56 MHz
Protection
Various types (protection against reflected power, overtemperature, overcurrent, and overvoltage), especially reflected power limiter
Display
Graphic display with touch screen or digital display
Remote control
Digital RS485
Working temperature
10-40°C
Cooling
Air conditioned
Output impedance
50Ω(resistive)
Dimensions (cm)
Depends on device output
Weight
Depends on device output
Output connector
N – 7/16
Box material
aluminium


  • RF generation Models
     
    RFG150
    RFG300
    RFG600
    RFG1000
    RFG2000
    RFG5000
    Frequency (MHz)
    13.56
    13.56
    13.56
    13.56
    13.56
    13.56
    Power (W)
    150
    300
    600
    1000
    2000
    5000
    Output Impedance (ohms)
    50
    50
    50
    50
    50
    50
    Connection type
    Analog & Digital max485
    Analog & Digital max485
    Analog & Digital max485
    Analog & Digital max485
    Analog & Digital max485
    Analog & Digital max485
    Front Panel display
    LCD
    LCD
    LCD
    LCD
    7segment
    7segment
    Output Connector
    N
    N
    N
    N
    N
    7/16
    Touch Screen
    Yes
    Yes
    Yes
    Yes
    No
    No
    Input Power
    Single-phase
    Single-phase
    Single-phase
    Single-phase
    3phase
    3phase
    Cooling
    air-cooled
    air-cooled
    air-cooled
    air-cooled
    air-cooled
    air&water-cooled

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Specialising in materials deposition, Vac Techniche has developed working relationships with key Universities and researchers facilities world wide.

RF Plasma Generators 300W Catalogue

VacTechniche RF Generators

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Frequently Asked Questions

RF Plasma Generators 300W

An RF Plasma Generator uses radio frequency (RF) power to ionize gases, creating plasma. This plasma is utilized in various industrial applications, such as surface modification, cleaning, and coating. The RF plasma system achieves this by applying an RF voltage to a gas, generating a field that ionizes the gas molecules and produces plasma.
 
Our RF Plasma Generators in the 100-300W range are ideal for applications such as:
  • Surface activation
  • Etching and coating in microelectronics
  • Medical device manufacturing
  • Thin film deposition and precision cleaning
Our RF Plasma Generators offer precise power control, allowing users to adjust the output between 100W and 300W. This flexibility supports various process requirements and can be customized based on the specific application.
 
Our RF Plasma Generators offer precise power control, allowing users to adjust the output between 100W and 300W. This flexibility supports various process requirements and can be customized based on the specific application.
Regular maintenance is minimal but essential for optimal performance. This typically includes checking connections, inspecting for gas leaks, and ensuring the generator’s internal cooling system is functioning correctly.
Yes, VacTechniche provides full technical support for installation, calibration, and troubleshooting of our RF Plasma Generators. Contact our support team for any assistance needed.
 
 
Operators should follow all safety guidelines, including proper ventilation, handling of gases, and using protective equipment. Our equipment includes built-in safety features, but we recommend following all standard operating procedures to ensure safe use.
 
With regular maintenance, our RF Plasma Generators have an extended operational lifespan, with most units designed for continuous, high-performance use in industrial environments.
 
 
Our RF Plasma Generators offer precise power control, allowing users to adjust the output between 100W and 300W. This flexibility supports various process requirements and can be customized based on the specific application.

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RF Plasma Generators 100-300W

For 2″ Magnetron Sputtering and Plasma generation

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