Vacuum Technology & Application Consultancy

RF Power Supplies

RF Plasma Generators

RF (Radio Frequency) plasma generators create controlled plasma for applications like semiconductor manufacturing and material processing. They offer precise ionization control, enabling uniform surface modifications crucial for processes such as thin-film deposition and plasma etching.
 

RF Plasma Advantages

RFG-300

RF Plasma Generator
100W-300W

RF Plasma Source Working Principle

RFG-600

RF Plasma Generator
300W-600W

Plasma Generation Using RF

RF-MN5000W

(25KV) Automatic Matching Network

Plasma Generation Using RF

RF-MN300W

(3KV) Automatic
Matching Network

RF Plasma Generation Process

RF-MN3000W

(15KV) Automatic Matching Network

RF in Plasma Processing

RF-MN Control

Auto/Manual Tune and Control

Sputtering-RF-and-DC-Magnetrons

Sputtering

RF and DC Magnetrons