Reactive Ion Etch: RIE
SEM Coaters | Sputter Coaters
SEM/TEM sample prep Vac Techniche
MRIE03VT-a Table Top RIE System, manufactured by “Vac Techniche Ltd”, with the following Specification combination, is a unique product.
Chamber dimensions:
Number of injection gas: 4 MFC for more capability in different process design.
Ar: 100 SCCM
N2: 50 SCCM
O2: 100 SCCM
SF6: 50SCCM.
More Information
Reactive Ion Etch: RIE
Process design capability with up to 40 different Sequences. Ability to save 5 different Processes parameters.(recipes) Up to 300W, 13.56MHz RF Plasma source with Fast and stable Automatic impedance matching. Compact design and small dimensions. System external size: Chamber internal size. Sample in and max size Cooled sample holder for sample from ….. to …..
Process design capability with up to 40 different Sequences.
Ability to save 5 different Processes parameters.(recipes)
Up to 300W, 13.56MHz RF Plasma source with Fast and stable Automatic impedance matching.
Compact design and small dimensions.
System external size:
Chamber internal size.
Sample in and max size
Cooled sample holder for sample from ….. to …..
The DSR1-170 is set up as a sputter coater specifically designed for preparing samples for scanning electron microscopy (SEM).
The DSR1, equipped with a 2-inch magnetron cathode and an 80W switching DC power supply, is versatile for various research and thin-film applications. Additionally, it can be outfitted with a water-cooled cathode, making it suitable for extended deposition processes. This model accommodates substrates of up to 4 inches in size.
