Vacuum Technology & Application Consultancy

Reacto9ve Ion Etch

Reactive Ion Etch: RIE

Vac Techniche

MRIE03VT-a Table Top RIE System, manufactured by “Vac Techniche Ltd”, with the following Specification combination, is a unique product.

Chamber dimensions:
Number of injection gas: 4 MFC for more capability in different process design.
Ar: 100 SCCM
N2: 50 SCCM
O2: 100 SCCM
SF6: 50SCCM.

Process design capability with up to 40 different Sequences. Ability to save 5 different Processes parameters.(recipes) Up to 300W, 13.56MHz RF Plasma source with Fast and stable Automatic impedance matching. Compact design and small dimensions. System external size: Chamber internal size. Sample in and max size Cooled sample holder for sample from ….. to …..

  • Process design capability with up to 40 different Sequences.
  • Ability to save 5 different Processes parameters.(recipes)
  • Up to 300W, 13.56MHz RF Plasma source with Fast and stable Automatic impedance matching.
  • Compact design and small dimensions.
  • System external size:
    Chamber internal size.
  • Sample in and max size
    Cooled sample holder for sample from ….. to …..

Categories: Rapid Thermal Annealer

table top Reactive Ion Etching Systems